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File:Slowetch2 data 100%load.png

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All the wafers have no mask/pattern, 100% load. The process was run after 10 mins chamber clean + 5 mins of TDESC clean

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current09:29, 28 July 2025Thumbnail for version as of 09:29, 28 July 20251,141 × 720 (297 KB)Prakus (talk | contribs)

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