File:Rs AmorBor vs PolyBor .png

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Sheet resistance on Boron doped poly-si using "POLYBOR" recipe, deposition time : 30 minutes, B2H6 flow at 7 sccm and 30 sccm, anneal : 950C 1 hour and Boron doped a-Si using "AMORBOR" recipe, Deposition time : 75 minutes, B2H6 flow at 7sccm, anneal: 950C 1hour. (Result from Trine H. Christensen DTU Space)

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current09:30, 19 February 2015Thumbnail for version as of 09:30, 19 February 20151,172 × 951 (28 KB)Paphol (talk | contribs)Sheet resistance on Boron doped poly-si using "POLYBOR" recipe, deposition time : 30 minutes, B2H6 flow at 7 sccm and 30 sccm, anneal : 950C 1 hour and Boron doped a-Si using "AMORBOR" recipe, Deposition time : 75 minutes, B2H6 flow at 7sccm, anneal: 9...

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