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• 22:49, 5 May 2023 Thope talk contribs created page Specific Process Knowledge/Lithography/EBeamLithography/JEOLAlignment (Created page with "=Aligned exposure on JEOL 9500= There is quite a few things to remember in order to align an exposure to an existing pattern. The example below is a step by step guide illustrating global substrate alignment as well as chip alignment. ==Job preparation== ==Chip alignment== Chip alignment requires a global alignment to be made first to establish the wafer coordinate system. Hence a global alignment using '''GLMDET''' is used initially as in the example above. To further...")