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• 09:56, 12 January 2026 Jehem talk contribs created page Specific Process Knowledge/Lithography/Development/SU8 developer (Created page with "==Developer: SU8 (Wet Bench)== 400px|right|thumb|The Developer: SU8 (Wet Bench) is located in E-4. The SU8-Developer bench is a manually operated wet bench for submersion development of SU-8 photoresist in PGMEA (supplied in the cleanroom as mr-Dev 600). The development process is in two stages; one bath (FIRST) to dissolve the bulk of the resist, and a second, cleaner bath (FINAL) to finish the development. The development time is controlled manual...")