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• 11:23, 19 May 2011 Jml talk contribs uploaded File:WF 2E09a mar23 2011-120.jpg (Etching of nanostructures in Si using DRIE-Pegasus: nano1.42 recipe, Run ID 2150, time 120 secs, SF6 38, C4F8 75, 4mtorr, 800/40 coil/platen, -20 degs.)