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• 14:29, 6 April 2011 Jml talk contribs uploaded File:WF 2E04 mar23 2011-030b.jpg (Etching of nanostructures in Si using the ICP metal etcher: Sinano3.31 recipe, Run ID 461, 462 and 463, time 60, 120 and 180 secs, BCl3 5, HBr 15, 2mtorr, 900/75 coil/platen, 50 degs. 30 mm spacers)