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• 14:49, 15 March 2011 Jml talk contribs uploaded File:WF 2B5 feb06 2011-060.jpg (Etching of nanostructures in Si using the ICP metal etcher: Sinano3.4 recipe, Run ID 431, time 120 secs, BCl3 5, HBr 15, 2mtorr, 900/90 coil/platen, 20 degs.)