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• 09:09, 3 December 2010 BGE talk contribs uploaded File:BGE Glass etch Cr50Au400n1 05.jpg (15min HF 40% etch of borofloat with 50/400 nm Cr/Au mask made in the Alcatel E-beam evaporator. Resist for masking the Cr/Au etch has been left on and baked at 120 degrees of ½ hour. The image is taken a random place on the wafer.)