Equipment
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SSE Spinner
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KS Spinner
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Purpose
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- Spinning and baking of AZ2514E resist
- Spinning and baking of AZ4562 resist
- Spinning and baking of e-beam resist
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- Spinning and baking of AZ2514E resist
- Spinning and baking of AZ4562 resist
- Spinning and baking of SU8 resist
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Performance
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Substrate handling
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- Cassette-to-cassette
- Edge handling chuck
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- Single substrate
- Non-vacuum chuck for fragile substrates
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Permanent media
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- AZ5214E resist
- AZ4562 resist
- Acetone for chuck cleaning
- Acetone for drip pan
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- AZ5214E resist
- PGMEA for edge bead removal
- Acetone for chuck cleaning
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Manual dispense option
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- yes
- pneumatic dispense for SU8 resist
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Process parameter range
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Parameter 1
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Parameter 2
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Substrates
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Batch size
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- 24 50 mm wafers
- 24 100 mm wafers
- 24 150 mm wafers
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- 1 100 mm wafers
- 1 150 mm wafers
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Allowed materials
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- Allowed material 1
- Allowed material 2
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- Allowed material 1
- Allowed material 2
- Allowed material 3
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