Specific Process Knowledge/Thin film deposition/Deposition of Germanium
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Deposition of Germanium
Germanium can be deposited by thermal evaporation.
| Thermal evaporation (Wordentec) | |
|---|---|
| Batch size |
|
| Pre-clean | RF Ar clean |
| Layer thickness | 10Å to about 2000Å |
| Deposition rate | From 0.4 Å/s up to about ~2Å/s |
| Comment | Recommended for unexposed e-beam resist |
| Allowed substrates |
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| Allowed materials |
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