Specific Process Knowledge/Thin film deposition/Deposition of Tungsten
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Tungsten (W) can be deposited by e-beam evaporation. In the chart below you can compare the different deposition equipment.
| E-beam evaporation (Alcatel) | |
|---|---|
| Batch size |
|
| Pre-clean | RF Ar clean |
| Layer thickness | 10Å to 1µm |
| Deposition rate | 2Å/s to 15Å/s |