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Etchning of Polymers

Stripping of polymers are often done by wet chemistry in a solvent that dissolves the given polymer. If wet chemistry cannot be used or a more controled etch of the polymer is needed a plasma system is used instead. Plasma ashers are design for removing polymers in primarily oxygen plasmas. It you need a more directional etch with a masking material RIE2 or ASE can be used.

Polymer Etch by ASE

Plasma asher 1

Plasma asher 2

Etch of Photo Resist using RIE

Wet Polymer Etch

Comparison method 1 and method 2 for the process

	ASE	Plasma asher 1	Plasma asher 2	RIE2	By wet etch
Generel description	Generel description - method 1	Generel description - method 2	Generel description - method 3	Generel description - method 4	Generel description - method 5
Parameter 1	A B	A B	A B	A B	A B
Parameter 2	A B C	A	A	A	A
Substrate size	# small samples # 50 mm wafers # 100 mm wafers # 150 mm wafers	# small samples # 50 mm wafers # 100 mm wafers # 150 mm wafers	# small samples # 50 mm wafers # 100 mm wafers # 150 mm wafers	# small samples # 50 mm wafers # 100 mm wafers # 150 mm wafers	# small samples # 50 mm wafers # 100 mm wafers # 150 mm wafers
Allowed materials	Allowed material 1 Allowed material 2	Allowed material 1 Allowed material 2 Allowed material 3	Allowed material 1 Allowed material 2	Allowed material 1 Allowed material 2	Allowed material 1 Allowed material 2