Specific Process Knowledge/Etch/AOE (Advanced Oxide Etch)/Remove resist in the AOE

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Remove AZ resist in the AOE using the recipe Descum

Parameter	Descum
Coil Power [W]	2000
Platen Power [W]	30
Platen temperature [oC]	0
O${}_2$ flow [sccm]	99
Pressure [mTorr]	10.0 (strike pressure 20.0 mTorr)

Typical results	tested by bge@danchip
AZ resist etch rate	~41 nm/s

BARC etching

I have tried once etching BARC with recipe m_res_ny:

Parameter	Resist mask
Coil Power [W]	1300
Platen Power [W]	200
Platen temperature [oC]	0
He flow [sccm]	174
C${}_4$F${}_8$ flow [sccm]	5
H${}_2$ flow [sccm]	4
Pressure [mTorr]	4
Etch rate in BARC [nm/min]	2