Specific Process Knowledge/Etch/ICP Metal Etcher/silicon

Silicon etching on the ICP Metal Etcher

In the primary silicon etcher at Danchip, the DRIE-Pegasus (Silicon Etch)|DRIE-Pegasus, silicon is etched using a fluorine based plasma (with SF₆ as etch gas). Silicon is also etched by chlorine and bromine.

• Chlorine/Bromine etch of nanostructures in silicon