Specific Process Knowledge/Etch/DRIE-Pegasus
The DRIE Pegasus at Danchip
The Bosch process
The DRIE Pegasus is a state-of-art silicon dry etcher that offers outstanding performance in terms of etch rate, uniformity etc. It uses the so-called Bosch process to achieve excellent control of the etched features. Click here for more fundamental information of the system.
User manuals etc.
The user manual, quality control procedure and the results may all be found on the DRIE-Pegasus LabManager page.
Important information
In August 2011 we introduced a new set of rules regarding the loading of wafers. In you were trained prior to this, you can find more information here.
Acceptance test
The instrument was opened for users in April 2010 when the acceptance test was signed. This was based on the performance of five standard recipes (A, B, C, D and SOI) that are further examined below. The acceptance test report is found here.
Process information
Process notation
Describing a process recipe on the Pegasus may sometimes be difficult because of the great flexibility of the instrument. A compact and precise notation is therefore required for the recipes. Click here to find a short description of the official SPTS notation.
Other etch processes
| Equipment | Equipment 1 | |
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| Purpose |
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| Performance | Response 1 |
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| Response 2 |
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| Process parameter range | Parameter 1 |
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| Parameter 2 |
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| Substrates | Batch size |
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| Allowed materials |
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Additional information
Material from SPTS