Development of continuous nanoetch
Recipe
|
nano1.0
|
nano1.1
|
nano1.2
|
nano1.3
|
nano1.21
|
nano1.4
|
nano1.41
|
nano1.42
|
nano1.43
|
C4F8 (sccm)
|
52
|
52
|
52
|
52
|
75
|
75
|
75
|
75
|
75
|
SF6 (sccm)
|
38
|
38
|
38
|
38
|
38
|
38
|
38
|
38
|
38
|
O2 (sccm)
|
0
|
0
|
0
|
0
|
0
|
0
|
0
|
0
|
0
|
Coil power (W)
|
800 (F)
|
600 (F)
|
800 (F)
|
600 (F)
|
800 (F)
|
800 (F)
|
800 (F)
|
800 (F)
|
800 (F)
|
Platen power (W)
|
50
|
50
|
50
|
40
|
50
|
50
|
75
|
40
|
30
|
Pressure (mtorr)
|
4
|
4
|
4
|
4
|
4
|
4
|
4
|
4
|
4
|
Temperature (degs C)
|
10
|
10
|
-10
|
-10
|
-10
|
-20
|
-20
|
-20
|
-20
|
Process time (s)
|
120
|
120
|
120
|
120
|
120
|
120
|
120
|
120
|
120
|
Etch rates (nm/min)
|
Averages |
295 |
228 |
299 |
235 |
183 |
183 |
166 |
160 |
148
|
Std. Dev |
36 |
29 |
37 |
20 |
9 |
9 |
9 |
8 |
6
|
Zep etch rate (nm/min)
|
|
|
172 |
95 |
94 |
69 |
67 |
101 |
65 |
55
|
Sidewall angle (degrees)
|
Averages |
93 |
94 |
92 |
94 |
91 |
91 |
90 |
90 |
90
|
Std. Dev |
1 |
1 |
0 |
1 |
0 |
0 |
1 |
0 |
0
|
CD loss (nm pr edge)
|
Averages |
-11 |
-13 |
-17 |
-10 |
-10 |
-10 |
-20 |
-13 |
-24
|
Std. Dev |
12 |
10 |
11 |
14 |
15 |
15 |
16 |
15 |
21
|
Bowing (nm)
|
Averages |
31 |
42 |
13 |
16 |
6 |
6 |
3 |
-3 |
0
|
Std. Dev |
7 |
6 |
4 |
3 |
2 |
2 |
2 |
3 |
1
|
Bottom curvature
|
Averages |
-45 |
-45 |
-44 |
-43 |
-32 |
-32 |
-34 |
-32 |
-39
|
Std. Dev |
5 |
7 |
4 |
9 |
10 |
10 |
9 |
8 |
9
|
Images
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Images
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Images
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Images
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Development of switched nanoetch process
On the basis of the pxnano2 recipe from the ASE we will try to make a similar Bosch process on the Pegasus. The substrates are 6" wafers with
Recipe
|
Nanobosch1
|
Nanobosch2
|
Nanobosch3
|
Nanobosch4
|
Nanobosch5
|
Cycle
|
Etch
|
Dep
|
Etch
|
Dep
|
Etch
|
Dep
|
Etch
|
Dep
|
Etch
|
Dep
|
C4F8 (sccm)
|
50
|
50
|
|
|
|
|
|
|
|
|
SF6 (sccm)
|
50
|
0
|
|
|
|
|
|
|
|
|
O2 (sccm)
|
5
|
0
|
|
|
|
|
|
|
|
|
Coil power (W)
|
350
|
500
|
|
|
|
|
|
|
|
|
Platen power (W)
|
30
|
0
|
|
|
|
|
|
|
|
|
Pressure (mtorr)
|
10
|
10
|
|
|
|
|
|
|
|
|
Temperature (degs C)
|
20
|
|
|
|
|
Duration (cycles/time)
|
5
|
|
|
|
|
Etch rates (nm/min)
|
Averages |
. |
. |
. |
. |
. |
. |
. |
. |
.
|
Std. Dev |
. |
. |
. |
. |
. |
. |
. |
. |
.
|
Zep etch rate (nm/min)
|
Averages |
. |
. |
. |
. |
. |
. |
. |
. |
.
|
Sidewall angle (degrees)
|
Averages |
. |
. |
. |
. |
. |
. |
. |
. |
.
|
Std. Dev |
. |
. |
. |
. |
. |
. |
. |
. |
.
|
CD loss (nm pr edge)
|
Averages |
. |
. |
. |
. |
. |
. |
. |
. |
.
|
Std. Dev |
. |
. |
. |
. |
. |
. |
. |
. |
.
|
Bowing (nm)
|
Averages |
. |
. |
. |
. |
. |
. |
. |
. |
.
|
Std. Dev |
. |
. |
. |
. |
. |
. |
. |
. |
.
|
Bottom curvature
|
Averages |
. |
. |
. |
. |
. |
. |
. |
. |
.
|
Std. Dev |
. |
. |
. |
. |
. |
. |
. |
. |
.
|
Images
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Images
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Images
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Images
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Images
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