Specific Process Knowledge/Thin film deposition/Si sputter in Wordentec

Silicon sputter

Silicon can be deposited in Wordentec.

Parameters

Listed below are tried parameters, that can be used during deposition. Use the rates as a start value, and make a test to be sure that you get the right thickness.

Please don´t use higher power then 180W, since the target then could breake into a lot of small pieces.

	Settings 1	Settings 2
Process type	Sputtering	Sputtering
Power	130W	170W
Sputter pressure	5*10-3	1*10-2
Rate	About 0,7 Å/s	About 0,6 Å/s