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Specific Process Knowledge/Lithography/EBeamLithography/ma-N 2400

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Spin coating

The resist ma-N 2400 can be spin coated on LabSpin 2 and 3 using the CSAR/PMMA bowlset. A spin curve for ma-N 2400.05 is provided below. Process parameters are:

  • Date: May 31st 2024
  • Coater: LabSpin 2
  • Substrate: 2" Si
  • Acceleration: 1000 RPM/s
  • Time: 60 s
  • Baking temperature: 90C (setpoint at 100C)
  • Baking time: 60 s
 

ma-N 2400.05 spin curve.

Resulting resist thickness can be determined as y = axb+c, where y is thickness [nm], x is spin speed [RPM], a = 1015400, b = -1.1 and c = 368.3.

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