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Specific Process Knowledge/Thin film deposition/Deposition of Tungsten

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< Specific Process Knowledge | Thin film deposition

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Tungsten (W) can be deposited by e-beam evaporation. In the chart below you can compare the different deposition equipment.

	E-beam evaporation (Alcatel)
Batch size	Up to 1x4" wafers smaller pieces
Pre-clean	RF Ar clean
Layer thickness	10Å to 1µm
Deposition rate	2Å/s to 15Å/s

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