Jump to content

Specific Process Knowledge/Etch/AOE (Advanced Oxide Etch)/Quartz etch using AOE

From LabAdviser

< Specific Process Knowledge | Etch | AOE (Advanced Oxide Etch)

Revision as of 07:53, 9 August 2011 by BGE (talk | contribs) (→Some priliminary results)

(diff) ← Older revision | Latest revision (diff) | Newer revision → (diff)

Nanoetch in quartz 65mmx65mmx6.25mm substrates

by bge@danchip

Some priliminary results

Recipe used STS65x65:

Parameter	Resist mask
Coil Power [W]	1200
Platen Power [W]	500
Platen temperature [^oC]	50
CF $_{4}$ flow [sccm]	43
C $_{4}$ F $_{8}$ flow [sccm]	20
O $_{2}$ flow [sccm]	10
Pressure [mTorr]	8

Retrieved from "https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Etch/AOE_(Advanced_Oxide_Etch)/Quartz_etch_using_AOE&oldid=5547"