Resist Strip

Resist strip bench in D-3

In the resist strip it is allowed to strip resist that is deposited on a metal layer. It is not allowed to strip resist with metal on top (lift off). Furthermore no SU-8 is allowed in the bath.

There are one Remover 1165 bath for stripping and one IPA bath for rinsing.

Here are the main rules for resist strip use:

Place the wafers in a wafer holder and put them in the first bath for 10 min, this time is depending how much resist you have on the surface.
After the strip rinse your wafers in the IPA bath for 2-3 min.
Rinse your wafers for 4-5 min. in running water after stripping.

The user manual and contact information can be found in LabManager: Resist Strip - requires login