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Specific Process Knowledge/Thermal Process/Oxidation/Breakdown voltage measurements/A2 furnace break-down voltage measurement results

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Revision as of 11:52, 16 September 2025 by Pevo (talk | contribs) (Created page with "==Breakdown voltage results for the A2 Gate Oxide furnace== ===Dry oxidation=== {| border="2" cellspacing="2" cellpadding="5" style="text-align: center;" |- |'''Date''' |'''Oxidation recipe''' |'''Oxide thickness''' |'''Absolute break-down voltage''' |'''Relative break-down voltage''' |- |'''February 2022''' |DRY1050 |150 nm |350x350px|thumb|left |image:2022-02-08_10-56-57_Wafer_A2_150nm_Rel.png|350x350px|thumb|le...")
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Breakdown voltage results for the A2 Gate Oxide furnace

Dry oxidation

Date Oxidation recipe Oxide thickness Absolute break-down voltage Relative break-down voltage
February 2022 DRY1050 150 nm
November 2023 DRY1100 585 nm
January 2024 DRY1050 226 nm
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