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Specific Process Knowledge/Thin film deposition/Deposition of Niobium Nitride

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Deposition of Niobium Nitride

Deposition of ScN can only be done by reactive sputtering using Sc target.

The only tool for this application is the Cluster-based multi-chamber high vacuum sputtering deposition system, commonly referred to as the 'Cluster Lesker.' The operating process is thoroughly documented and described in detail.:

At the moment (July 2025) we have a 3-inch Nb target (0.250" thick) for PC1 and PC3.

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