Specific Process Knowledge/Etch/AOE (Advanced Oxide Etch)/Remove resist in the AOE
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Remove AZ resist in the AOE using the recipe Descum
| Parameter | Descum (also settings for TDESC10M 20241029) |
|---|---|
| Coil Power [W] | 2000 |
| Platen Power [W] | 30 |
| Platen temperature [oC] | 0 |
| O flow [sccm] | 99 |
| Pressure [mTorr] | 10.0 (strike pressure 20.0 mTorr) |
| Typical results | tested by bge@nanolab |
|---|---|
| AZ resist etch rate | ~41 nm/s |
BARC etching
I have tried once etching BARC with recipe SiO2_res:
| Parameter | Recipe: SiO2_res | Recipe: Barcetch |
|---|---|---|
| Coil Power [W] | 1300 | 400 |
| Platen Power [W] | 200 | 100 |
| Platen temperature [oC] | 0 | 0 |
| He flow [sccm] | 174 | 0 |
| CF flow [sccm] | 5 | 0 |
| CF4 flow [sccm] | 0 | 4 |
| H flow [sccm] | 4 | 20 |
| Pressure [mTorr] | 4 | 1 |
| Etch rate in BARC [nm/sec] | 2 | 1 |
| Selectivity to DUV resist [Barc:resist] | ? | [1-2:1] |