Specific Process Knowledge/Pattern Design/Mask Specifications

Below you can find two examples on how to write the specification for 5" and 7" masks.

5" masks

All Layers: 5" chromium mask fracture limits ((-50000, -50000),(50000, 50000)) Dark periphery Chromium down

GDS-file: GLO006_v7.gds Top cell: wafer

Layer (GDS number): 01 Mask Type: Digitised data= Dark, right reading Text(max 30 characters): init-2019-Nitride-etch

Layer (GDS number): 02 Mask Type: Digitised data= Clear, Wrong reading Text(max 30 characters): init-2019-KOH-backside

For 7" masks:

All Layers: 7" chromium mask fracture limits ((-70000, -70000),(70000, 70000)) Dark periphery Chromium down

GDS-file: GLO006_v7.gds Top cell: wafer

Layer (GDS number): 01 Mask Type: Digitised data= Dark, right reading Text(max 30 characters): init-2019-Nitride-etch

Layer (GDS number): 02 Mask Type: Digitised data= Clear, Wrong reading Text(max 30 characters): init-2019-KOH-backside