File:WF 2E09b mar23 2011-030.jpg

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Etching of nanostructures in Si using ASE: pxnano2 recipe, time 96 secs (12 cycles), temp 20 degrees

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	Date/Time	Thumbnail	Dimensions	User	Comment
current	12:24, 19 May 2011		1,024 × 768 (293 KB)	Jml (talk \| contribs)	Etching of nanostructures in Si using ASE: pxnano2 recipe, time 96 secs (12 cycles), temp 20 degrees

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