File:WF 2E09a mar23 2011-030.jpg

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Revision as of 11:23, 19 May 2011 by Jml (talk | contribs) (Etching of nanostructures in Si using DRIE-Pegasus: nano1.42 recipe, Run ID 2150, time 120 secs, SF6 38, C4F8 75, 4mtorr, 800/40 coil/platen, -20 degs.)
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Etching of nanostructures in Si using DRIE-Pegasus: nano1.42 recipe, Run ID 2150, time 120 secs, SF6 38, C4F8 75, 4mtorr, 800/40 coil/platen, -20 degs.

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current11:23, 19 May 2011Thumbnail for version as of 11:23, 19 May 20111,024 × 768 (379 KB)Jml (talk | contribs)Etching of nanostructures in Si using DRIE-Pegasus: nano1.42 recipe, Run ID 2150, time 120 secs, SF6 38, C4F8 75, 4mtorr, 800/40 coil/platen, -20 degs.

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