Specific Process Knowledge/Etch/Etching of Molybdenum

From LabAdviser
< Specific Process Knowledge‎ | Etch
Revision as of 15:07, 28 March 2025 by Mbec (talk | contribs) (Created page with "=<span style="background:#FF2800">THIS PAGE IS UNDER CONSTRUCTION</span>200px= <code><nowiki>=<span style="background:#FF2800">THIS PAGE IS UNDER CONSTRUCTION</span>200px=</nowiki></code> <!-- =<span style="background:#FF2800">THIS PAGE IS UNDER CONSTRUCTION</span>200px= --> ==Comparison of Molybdenum Etch Methods== {|border="1" cellspacing="1" cellpadding="3" style...")
(diff) ← Older revision | Latest revision (diff) | Newer revision → (diff)

THIS PAGE IS UNDER CONSTRUCTION

=<span style="background:#FF2800">THIS PAGE IS UNDER CONSTRUCTION</span>[[image:Under_construction.png|200px]]=


Comparison of Molybdenum Etch Methods

Mo wet etch Specific_Process_Knowledge/Etch/Dry etch
Generel description Wet etch of Mo using Chrome etch 18 Dry etch of Mo
Etch rate range
  • 120 nm etch after 30 sec (not tested yet)
  • (not tested yet)
Etch profile
  • Isotropic
  • Anisotropic (not tested yet)
Masking material
  • AZ resist as a mask (hard baked at 120C for 120sec) led to an under etch of 2ish µm
  • Not tested yet
Substrate size
  • Any size and number that can go inside the beaker in use
Allowed materials

No restrictions cross contamination wise as long as you use the right beaker and make sure that they are safe to enter in the chemicals

Retrieved from "https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Etch/Etching_of_Molybdenum&oldid=51401"