File:WF 2E08b 23mar2011-150.jpg

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Revision as of 08:30, 9 May 2011 by Jml (talk | contribs) (Etching of nanostructures in Si using DRIE-Pegasus: nano1.43 recipe, Run ID 2018, time 120 secs, SF6 38, C4F8 75, 4mtorr, 800/30 coil/platen, -20 degs.)
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Etching of nanostructures in Si using DRIE-Pegasus: nano1.43 recipe, Run ID 2018, time 120 secs, SF6 38, C4F8 75, 4mtorr, 800/30 coil/platen, -20 degs.

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current08:30, 9 May 2011Thumbnail for version as of 08:30, 9 May 20111,024 × 768 (137 KB)Jml (talk | contribs)Etching of nanostructures in Si using DRIE-Pegasus: nano1.43 recipe, Run ID 2018, time 120 secs, SF6 38, C4F8 75, 4mtorr, 800/30 coil/platen, -20 degs.

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