File:WF 2E07a mar23 2011-120.jpg

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Revision as of 11:43, 29 April 2011 by Jml (talk | contribs) (Etching of nanostructures in Si using DRIE-Pegasus: nano1.4 recipe, Run ID 2000, time 120 secs, SF6 38, C4F8 75, 4mtorr, 800/50 coil/platen, -20 degs.)
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Etching of nanostructures in Si using DRIE-Pegasus: nano1.4 recipe, Run ID 2000, time 120 secs, SF6 38, C4F8 75, 4mtorr, 800/50 coil/platen, -20 degs.

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