Specific Process Knowledge/Lithography/EBeamLithography/AR-P 617

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Revision as of 10:45, 22 January 2024 by Thope (talk | contribs) (Created page with "AR-P 617 is a positive PMMA based E-beam resist from Allresist. =Spin coating= AR-P 617 can be spin coated on LabSpin 2 and 3 using the CSAR/PMMA bowlset. A spin curve for AR-P 617.06 is provided below. Process parameters are: *Coater: LabSpin 3 *Substrate: 2" Si *Acceleration: 1000 RPM/s Time: 60 s Baking temperature: 200C (setpoint at 222C) Baking time: 120 s")
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AR-P 617 is a positive PMMA based E-beam resist from Allresist.

Spin coating

AR-P 617 can be spin coated on LabSpin 2 and 3 using the CSAR/PMMA bowlset. A spin curve for AR-P 617.06 is provided below. Process parameters are:

  • Coater: LabSpin 3
  • Substrate: 2" Si
  • Acceleration: 1000 RPM/s

Time: 60 s Baking temperature: 200C (setpoint at 222C) Baking time: 120 s

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