File:WF 2C3feb2011-120.jpg

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Etching of nanostructures in Si using DRIE-Pegasus: nano1.0 recipe, Run ID 1801, time 120 secs, SF6 38, C4F8 52, 4mtorr, 800/50 coil/platen, 10 degs.

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	Date/Time	Thumbnail	Dimensions	User	Comment
current	16:15, 24 March 2011		1,024 × 768 (244 KB)	Jml (talk \| contribs)	Etching of nanostructures in Si using DRIE-Pegasus: nano1.0 recipe, Run ID 1801, time 120 secs, SF6 38, C4F8 52, 4mtorr, 800/50 coil/platen, 10 degs.

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