File:WF 2B1 feb06 2011-060.jpg
Size of this preview: 800 × 600 pixels. Other resolution: 1,024 × 768 pixels.
Original file (1,024 × 768 pixels, file size: 56 KB, MIME type: image/jpeg)
The profiles of the 180 nm thick zep resist wafers. The wafers have been over-exposed in the E-beam to make sure that all structures are opened - therefore the 30, 60, 90, 120 and 150 nm lines are somewhat wider.
File history
Click on a date/time to view the file as it appeared at that time.
| Date/Time | Thumbnail | Dimensions | User | Comment | |
|---|---|---|---|---|---|
| current | 08:52, 16 March 2011 | | 1,024 × 768 (56 KB) | Jml (talk | contribs) | The profiles of the 180 nm thick zep resist wafers. The wafers have been over-exposed in the E-beam to make sure that all structures are opened - therefore the 30, 60, 90, 120 and 150 nm lines are somewhat wider. |
You cannot overwrite this file.
File usage
The following page uses this file:
