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Specific Process Knowledge/Etch/DRIE-Pegasus/Pegasus-4/SiO2 Etch/Cr mask

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< Specific Process Knowledge | Etch | DRIE-Pegasus | Pegasus-4 | SiO2 Etch

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Unless otherwise stated, all content in this section was done by Berit Herstrøm, DTU Nanolab

EM tests with Cr mask on full wafer 6 min etch

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