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Specific Process Knowledge/Etch/DRIE-Pegasus/Pegasus-4/SiO2 Etch/EM with resist mask

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< Specific Process Knowledge‎ | Etch‎ | DRIE-Pegasus‎ | Pegasus-4‎ | SiO2 Etch

Revision as of 08:27, 11 September 2023 by Bghe (talk | contribs) (→‎Looking at bit on the effect of using electromagnets for etching SiO2 with DUV resist)

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Looking at bit on the effect of using electromagnets for etching SiO2 with DUV resist

Unless otherwise stated, all content in this section was done by Berit Herstrøm, DTU Nanolab

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