Specific Process Knowledge/Lithography/EBeamLithography/EBLProcessExamples
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Revision as of 12:54, 8 September 2023 by Thope (talk | contribs) (Created page with "This page is under construction. In time we will fill it with relevant process examples and relevant data. =Single spot EBL= Arrays of circular holes can be created by normal area writing of a mask of circular structures. It can however also be done with a single spot approach, where the beam will dwell at each spot for several µs and hence each spot will become a circular structure by local over exposure. You can read more about this method in the linked article. '''...")
This page is under construction. In time we will fill it with relevant process examples and relevant data.
Single spot EBL
Arrays of circular holes can be created by normal area writing of a mask of circular structures. It can however also be done with a single spot approach, where the beam will dwell at each spot for several µs and hence each spot will become a circular structure by local over exposure. You can read more about this method in the linked article.
Single-spot e-beam lithography for defining large arrays of nano-holes
Article on quality control on the JEOL 9500 system
Quality control of JEOL JBX-9500FSZ lithography system in a multi-user laboratory