File:WF 2B4 feb06 2011-120.jpg
Size of this preview: 800 × 600 pixels. Other resolution: 1,024 × 768 pixels.
Original file (1,024 × 768 pixels, file size: 264 KB, MIME type: image/jpeg)
Etching of nanostructures in Si using the ICP metal etcher: Sinano3.3 recipe, Run ID 430 and 432, time 180 secs, BCl3 5, HBr 15, 2mtorr, 900/75 coil/platen, 20 degs.
File history
Click on a date/time to view the file as it appeared at that time.
| Date/Time | Thumbnail | Dimensions | User | Comment | |
|---|---|---|---|---|---|
| current | 14:47, 15 March 2011 | | 1,024 × 768 (264 KB) | Jml (talk | contribs) | Etching of nanostructures in Si using the ICP metal etcher: Sinano3.3 recipe, Run ID 430 and 432, time 180 secs, BCl3 5, HBr 15, 2mtorr, 900/75 coil/platen, 20 degs. |
You cannot overwrite this file.
File usage
The following page uses this file:
