File:WF 2B2 feb06 2011-150.jpg
Size of this preview: 800 × 600 pixels. Other resolution: 1,024 × 768 pixels.
Original file (1,024 × 768 pixels, file size: 72 KB, MIME type: image/jpeg)
Etching of nanostructures in Si using the ICP metal etcher: Sinano3.1 recipe, Run ID 424 and 425 and 427, time 180 secs, BCl3 3, HBr 17, 2mtorr, 900/50 coil/platen, 20 degs.
File history
Click on a date/time to view the file as it appeared at that time.
| Date/Time | Thumbnail | Dimensions | User | Comment | |
|---|---|---|---|---|---|
| current | 14:43, 15 March 2011 | | 1,024 × 768 (72 KB) | Jml (talk | contribs) | Etching of nanostructures in Si using the ICP metal etcher: Sinano3.1 recipe, Run ID 424 and 425 and 427, time 180 secs, BCl3 3, HBr 17, 2mtorr, 900/50 coil/platen, 20 degs. |
You cannot overwrite this file.
File usage
The following page uses this file:
