Specific Process Knowledge/Etch/DRIE-Pegasus/FAQ/Masks

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Revision as of 09:59, 25 February 2011 by Jml (talk | contribs) (New page: ; Question 1 : I remember you said that you don't like Al as masking material because it will get sputtered off (am I right?) - but what about ALD deposited aluminium oxide - it is, as fa...)
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Question 1
I remember you said that you don't like Al as masking material because it will get sputtered off (am I

right?) - but what about ALD deposited aluminium oxide - it is, as far as I know, much harder and resistant than Al..?

Answer 1
We don't have experience with ALD deposited aluminium oxide as a mask, however for some ESC

configurations we have seen evidence of sputtering of the alumina uniformity shield surrounding the wafer; this would lead me to believe that the ALD aluminium oxide could still sputter and cause contamination issues.

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