Specific Process Knowledge/Etch/ICP Metal Etcher/silicon oxide/By Peixiong/images CF4

From LabAdviser
< Specific Process Knowledge‎ | Etch‎ | ICP Metal Etcher‎ | silicon oxide‎ | By Peixiong
Revision as of 15:21, 22 March 2023 by Bghe (talk | contribs)
(diff) ← Older revision | Latest revision (diff) | Newer revision → (diff)

All images on this page has been created by Peixiong Shi, DTU Nanolab

Images stepper_6A1_feb262013_step9

  • 6A1_feb262013_step9

Images stepper_6A4_feb262013_step9

  • 6A4_feb262013_step9
  • wafer edge
    wafer edge
  • wafer edge
    wafer edge
  • wafer edge
    wafer edge
  • wafer edge
    wafer edge
  • Position of the scanning: wafer edge
    Position of the scanning: wafer edge
  • wafer edge
    wafer edge
  • wafer edge
    wafer edge
  • wafer center
    wafer center
  • wafer center
    wafer center
  • wafer center
    wafer center
  • wafer center
    wafer center

Images Stepper_6A5_feb272013

  • 6A5_feb262013 step9 and step10
  • Wafer edge
    Wafer edge
  • Wafer edge
    Wafer edge
  • Wafer edge
    Wafer edge
  • Wafer edge
    Wafer edge
  • Wafer edge
    Wafer edge
  • Wafer edge
    Wafer edge
  • Wafer center
    Wafer center
  • Wafer center
    Wafer center
  • Wafer center
    Wafer center
  • Wafer center
    Wafer center
  • Wafer center
    Wafer center
  • Top view
    Top view
  • Top view
    Top view
  • Top view
    Top view
  • Top view
    Top view
  • Top view
    Top view
  • Top view
    Top view

images 3

  • 6A1_feb262013_step9
Retrieved from "https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Etch/ICP_Metal_Etcher/silicon_oxide/By_Peixiong/images_CF4&oldid=45286"