File:BGE Glass etch Cr50Au400n1 03.jpg
Size of this preview: 800 × 600 pixels. Other resolution: 2,560 × 1,920 pixels.
Original file (2,560 × 1,920 pixels, file size: 211 KB, MIME type: image/jpeg)
15min HF 40% etch of borofloat with 50/400 nm Cr/Au mask made in the Alcatel E-beam evaporator. Resist for masking the Cr/Au etch has been left on and baked at 120 degrees of ½ hour. The image is taken a random place on the wafer.
File history
Click on a date/time to view the file as it appeared at that time.
| Date/Time | Thumbnail | Dimensions | User | Comment | |
|---|---|---|---|---|---|
| current | 09:08, 3 December 2010 | | 2,560 × 1,920 (211 KB) | BGE (talk | contribs) | 15min HF 40% etch of borofloat with 50/400 nm Cr/Au mask made in the Alcatel E-beam evaporator. Resist for masking the Cr/Au etch has been left on and baked at 120 degrees of ½ hour. The image is taken a random place on the wafer. |
You cannot overwrite this file.
File usage
The following page uses this file:
