File:BGE Glass etch Lesker test1 05.jpg

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Revision as of 16:00, 1 December 2010 by BGE (talk | contribs) (Borofloat etch with silicon mask made in the Lesker at 200dg. Resist mask from the pattering has been removed before etching in 40% HF for 15 min.)
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Borofloat etch with silicon mask made in the Lesker at 200dg. Resist mask from the pattering has been removed before etching in 40% HF for 15 min.

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current16:00, 1 December 2010Thumbnail for version as of 16:00, 1 December 20102,560 × 1,920 (159 KB)BGE (talk | contribs)Borofloat etch with silicon mask made in the Lesker at 200dg. Resist mask from the pattering has been removed before etching in 40% HF for 15 min.

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