Specific Process Knowledge/Thermal Process/Jipelec RTP

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Jipelec - Rapid Thermal Processing

Jipelec RTP: Positioned in cleanroom 1

The Jipelec is a rapid thermal processing oven. It should be used for fast and well-controlled annealing or alloying of samples. It is possible to use a pyrometer to control the temperature (of the carrier).


Process parameter ranges Process Temperature
  • 0-1000 degree Celsius
Process pressure
  • atmosphere pressure
  • vacuum
Performance Substrate material allowed
  • Silicon
  • Silicon oxides
  • Silicon nitrides
  • Quartz
  • Polysilicon
  • Titan
  • III-V materials (on graphite carrier)
Allowed materials on substrate
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