Specific Process Knowledge/Etch/Overview of chemicals
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Chemical | Cas Nr. | Concentration | Grade | Comment |
---|---|---|---|---|
Acetone | Cas Nr.
67-64-1 |
99,8%-100% | VLSi | |
Ammoniumhydroxyd | Cas Nr.
1336-21-6 |
28% | VLSI | Comment |
Ammoniumperoxodisulfat | Cas Nr.
7727-54-0 |
98%-99,1% | Analyse | Comment |
Anisole Anhydrous | Cas Nr.
100-66-3 |
99,7% | GPR | Comment |
AR-600-546 Developer | Cas Nr.
no nr. |
not specific | not specific | Comment |
AR-600-71 Remover | Cas Nr.
no nr. |
not specific | not specific | Comment |
AR-6200.09 E-beam resist | Cas Nr.
no nr. |
not specific | not specific | Comment |
AZ 351B Developer | Cas Nr.
no nr. |
not specific | not specific | Comment |
AZ 4562 Photoresist | Cas Nr.
no nr. |
not specific | not specific | Comment |
AZ 5214E Photoresist | Cas Nr.
no nr. |
not specific | not specific | Comment |
AZ 726MIF developer | Cas Nr.
no nr. |
not specific | not specific | Comment |
AZ 726MIF developer (Tromle) | Cas Nr.
no nr. |
not specific | not specific | Comment |
AZ MiR 701 (29CPS) Photoresist | Cas Nr.
no nr. |
not specific | not specific | Comment |
AZ nLOF 2020 Photoresist | Cas Nr.
no nr. |
not specific | not specific | Comment |
Boric Acid powder | Cas Nr.
10043-35-3 |
not specific | Analytic | Comment |
Chrome etch 18 | Cas Nr.
no nr. |
not specific | not specific | Comment |
Developer MIBK Methylisobutylketon 4L | Cas Nr.
108-10-1 |
not specific | VLSI | Comment |
DUV42S-6,4 L ultra nowpak W/Closure lid | Cas Nr.
no nr. |
not specific | Aicello | Comment |
Ethanol | Cas Nr.
64-17-5 |
99,9%-100% | VLSI | Comment |
Hydrofluoric acid buffer (BHF/BOE) | Cas Nr.
no nr. |
12,5% | not specific | Comment |
Hydrofluoric acid buffer (BHF/BOE W/wetting agent) | Cas Nr.
no nr. |
12,5% | not specific | Comment |
Hexamethyldisilasan | Cas Nr.
999-97-3 |
not specific | not specific | Comment |
HYDROFLUORIC ACID (HF) | Cas Nr.
no nr. |
1% | VLSI | Comment |
Cas Nr.
no nr. |
10% | VLSI | Comment | |
Cas Nr.
no nr. |
40% | EMSURE® ISO for analysis | Comment | |
Cas Nr.
no nr. |
50% | VLSI | Comment | |
Hydrochloric acid | Cas Nr. 7647-01-0 | 37% | VLSI | Comment |
Hydrogenperoxid | Cas Nr. 7722-84-1 | 31% | VLSI | Comment |
KRF m230Y 6cP Gal | Cas Nr.
no nr. |
not specific | not specific | Comment |
KRF M35G 27cP Gal | Cas Nr.
no nr. |
not specific | not specific | Comment |
Microposit Remover 1165 | Cas Nr.
no nr. |
not specific | Grade | Comment |
Nitric acid | Cas Nr.
231-714-2 |
69% | VLSI | Comment |
Ortho-Phosphoric acid | Cas Nr.
7664-38-2 |
85% | VLSI | Comment |
Potassium hydroxide solution | Cas Nr.
1310-58-3 |
not specific | Selectipur | Comment |
Propanol | Cas Nr.
67-63-0 |
not specific | VLSi | Comment |
SU-8 2005 | Cas Nr.
no .nr |
not specific | not specific | Comment |
SU-8 2035 | Cas Nr.
no nr. |
not specific | not specific | Comment |
SU-8 2075 | Cas Nr.
no nr. |
not specific | not specific | Comment |
SU-8 Developer (Mr-dev 600) | Cas Nr.
no nr. |
not specific | not specific | Comment |
SU-8 Thinner | Cas Nr.
no nr. |
not specific | not specific | Comment |
Sulfamic acid | Cas Nr.
5329-14-6 |
not specific | Alkamlimetry | Comment |
Sulfuric acid | Cas Nr.
7664-93-9 |
95%-97% | VLSI | Comment |
TI spray | Cas Nr.
no nr. |
not specific | not specific | Comment |
ZED N50 | Cas Nr.
no nr. |
not specific | not specific | Comment |
Triton x-100 | Cas Nr.
9002-93-1 |
not specific | not specific | Comment |