Specific Process Knowledge/Etch/DRIE-Pegasus/DUVetch/nBoost04

Process runs

Date	Substrate Information				Process Information				SEM Images
	Wafer info	Mask	Material/ Exposed area	Tool / Operator	Conditioning	Recipe	Wafer ID	Comments
24/10-2014	4" DUV-BoxC wafer	stepper mask (50 nm barc + 250 nm krf)/Si	Si / 60+ % on die	Pegasus/jmli	3 minute TDESC clean + 30 sec barc etch	nanolab/jml/nano/nanoboost/nboost04 100 cycles or 13 minutes	S004436

HiRes images of S004436

• 
• 
• 
• 
• 
• 
• 
• 
• 
• 
•