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Specific Process Knowledge/Lithography/EBeamLithography/eLINE

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Process information for the Raith eLINE Plus system

Table of dose to clear on Si substrate:

Dose µC/cm2	AR-P 6200.09 (180 nm)	PMMA 950k	AR-N 8200.xx
10 kV
20 kV
30 kV

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