Specific Process Knowledge/Lithography/ARN8200

AR-N 8200

AR-N 8200 is a negative E-beam resist from Allresist, it is also known as "Medusa 82". A product presentation from Allresist is available here AR-N8200 presentation.

Contrast curve

Exposure dose for AR-N 8200 is very dependent on Post Exposure Bake (PEB) temperature. A contrast curve for four different PEB processes were obtained by the following process parameters.

AR-N 8200 Contrast Curve, Processed by THOPE, FEB 2022
Resist	Spin Coat	E-beam exposure	PEB	Development
AR-N8200.06 AllResist	LabSpin E-5, 4000 rpm, 60s, softbaked 10 min @ 150 degC	09-02-2016, JBX9500 E-2, 2nA aperture 5, doses 40-600 µC/cm2, 100 nm lines and 300 nm spaces	11-02-2016, Fumehood D-2, AR-600-546, rinsed in IPA 60s.	02-03-2016 AFM Icon, F-2, ScanAsyst in Air

Spin coating Labspin 2