Specific Process Knowledge/Lithography/ARN8200

From LabAdviser

AR-N 8200

AR-N 8200 is a negative E-beam resist from Allresist, it is also known as "Medusa 82". It is currently (Februrary 2022) being tested at DTU Nanolab.

Contrast curve

Exposure dose requirement for AR-N 8200 is very dependent on Post Exposure Bake (PEB) temperature. A contrast curve for four different PEB processes were obtained by the following process.

Spin coating Labspin 2


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