Specific Process Knowledge/Etch/III-V ICP
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The III-V ICP
Name: PRO ICP
Vendor: STS (now SPTS)
The III-V ICP is a state-of-the-art etch tool. The combination of advanced hardware and software enables you to either use the optimized standard processes or to tailor etch processes for your specific needs. The tool can be used for etching of different materials, but is primarily intented for etching of III-V materials. There are two endpoint systems connected to the system. An Optical End Point System (OES) and a LASER End Point system (LEP). Information on these can be found here: Specific Process Knowledge/Etch/DryEtchProcessing
The user manual, user APV and contact information can be found in LabManager:
Equipment info in LabManager
Process information
Etch recipes
Purpose | Dry etch of |
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Performance | Etch rates |
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Anisotropy |
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Process parameter range | Process pressure |
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RF Generators |
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Chiller temperature |
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Gas flows |
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Substrates | Batch size |
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Substrate material allowed |
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Possible masking material |
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Additional information
Wafer bonding
To find information on how to bond wafers or chips to a carrier wafer, click here.