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Specific Process Knowledge/Thin film deposition/Deposition of Palladium

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Palladium can be deposited by e-beam evaporation. In the chart below you can compare the different deposition equipment.

	E-beam evaporation (Alcatel)	E-beam evaporation (Leybold)
Batch size	Up to 1x4" wafers smaller pieces	8x4" wafers or 5x6" wafers
Pre-clean	RF Ar clean	Ar ion bombartment
Layer thickness	10Å to 1µm	10Å to 1500Å
Deposition rate	2Å/s to 15Å/s	1Å/s to 5Å/s

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